Diffusion furnace process characteristics

Diffusion furnace is one of the process equipment for the development of semiconductor devices such as transistors, thyristors and integrated circuits. It is mainly used in processes such as diffusion and oxidation.

The diffusion furnace is mainly composed of a control part, a purification part, a resistance heating furnace department, and a gas path part. The control part mainly controls the inlet and outlet, and the resistance heating furnace mainly controls the temperature part of the diffusion furnace, and the gas path mainly controls the flow rate of the diffusion source and the discharge amount of the exhaust gas.

The process control software of the diffusion furnace is used by pressing the "power on" button, starting the computer, and double-clicking the "diffusion monitoring system" icon to start the process control software. Enter your username and password to log in.

The temperature setting of the diffusion furnace mainly consists of three analog temperature controller patterns on the interface, corresponding to the three-stage temperature controller of the diffusion furnace.

The diffusion furnace is an electric resistance furnace that automatically controls the temperature. It consists of a temperature controller, a thyristor device and a furnace body. The furnace body is composed of a heat insulating material, a heating wire and a furnace tube. The temperature controller can control the device to automatically control the furnace temperature to keep the furnace temperature stable and uniform to meet the process requirements.

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